光刻头

Yvonne!

顶一个^_^

kievuserK

此贴原来只是想试一下新的ID,没想到展开讨论。我国早期生产的光刻镜头的资料很少。从外观上看设计时参考了日本尼康公司的同类产品。例如首帖里的镜头。 这类镜头改开后的情况就知道的更少了。
镜头上标注‘中华人民共和国制造’的镜头好像很少见到啊。

kievuserK

一款上照三厂生产的光刻镜头。

cdhunter

kievuserK 发表于 2015-5-19 07:53
我觉得也不能一概而论啊。

但早期的差距肯定大的，想想文革时期，真的能造出好镜头吗

kievuserK

cdhunter 发表于 2015-5-22 19:09
但早期的差距肯定大的，想想文革时期，真的能造出好镜头吗

早期主要解决有无的问题吧。据说608厂当年生产的某些规格的电影摄影镜头达到了国际同类产品的标准。

kievuserK

1978年生产的光刻镜头。做工精良。镜头前后盖也是金属的。不知道是否出口过？ 为什么要标上‘中华人民共和国’？

kievuserK

目前蔡司生产的极紫外光刻镜头用在了荷兰ASML公司的光刻机上。镜头造价高昂，约和数亿元人民币。

Advances in the field of camera lenses enabled Carl Zeiss to deliver new optics to German company Telefunken for lithography in 1968. In 1977, Carl Zeiss introduced the S-Planar 10/0.42, the first objective lens allow for the production of 1 μm structures in an opto-lithographic process.

This laid the foundation for the first wafer stepper.

The current partnership with Philips subsidiary Advanced Semiconductor Materials Lithography (ASML) also began in 1983 with the delivery of the first projection and illumination optics from Carl Zeiss.

This business relationship became a strategic alliance during fiscal year 1992/93. At Carl Zeiss, the new millennium marked the beginning of a new era in the semiconductor industry – particularly with respect to 193 nm technology, which brought about the first technology leap in the area of lithography optics since 1998. As a result of the increasing success of the Carl Zeiss Group, the decision was made to bundle the light, electron and ion-optical technologies into an independently operating company. In October 2001, Carl Zeiss SMT GmbH was founded with its subsidiaries Carl Zeiss Laser Optics GmbH, Carl Zeiss SMS GmbH, and Carl Zeiss NTS GmbH (in 2010, Carl Zeiss NTS changed over to the Microscopy division). The years that followed witnessed numerous innovations in the field of lithography optics for commercial microchip fabrication, including Starlith 1700i. Starlith optics use the immersion method – a procedure in which the air between the last lens and the top wafer su**ce is replaced with liquid – while simultaneously utilizing lens and mirror systems. In 2006, a new plant was officially inaugurated in Oberkochen. It is the most advanced development and production center for lithography optics in the world. Starlith 19xxi, produced starting in 2007, became a hit not only in the history of the Semiconductor Manufacturing Technology division, but also at Carl Zeiss as the top-selling product of the company. The year 2012 heralded the changeover of EUV Optics (Extreme Ultraviolet Radiation) to serial production, a new era in optical lithography.



附镜头图片

kievuserK

“I want to emphasize that Zeiss was very active in the field of special lenses for industrial use, and although each type has been produced in very limited runs, even just three examples, the sequence of models is much broader than you can imagine; here is a certainly incomplete list of the different models until 2000, namely those easier to classify: S-Planar 45mm f/1, S-Planar 38mm f/1,1, S-Planar 42mm f/1,1, S-Planar 68mm f/1,1, S-Planar 38mm f/1,2, S-Planar 42mm f/1,2, S-Planar 46mm f/1,2, S-Planar 60mm f/1,3, S-Planar 65mm f/1,3, S-Planar 37mm f/1,4, S-Planar 41mm f/1,4, S-Planar 75mm f/1,4, S-Planar 69mm f/1,5, S-Planar 125mm f/1,5, S-Planar 14mm f/1,6, S-Planar 25mm f/1,6, S-Planar 31mm f/1,6, S-Planar 50mm f/1,6, S-Planar 40mm f/1,7, S-Planar 0,1mm f/2, S-Planar 210mm f/2, S-Planar 95mm f/2,1, S-Planar 100mm f/2,8, S-Planar 14mm f/3,3, S-Planar 48mm f/3,9, S-Planar 32mm f/4, S-Planar 60mm f/4, S-Planar 74mm f/4, S-Planar 135mm f/4, S-Planar 195mm f/4, S-Orthoplanar 50mm f/4, S-Orthoplanar 60mm f/4, S-Planar 0,4mm f/5, S-Planar 0,42mm f/5, S-Planar 0,43mm f/5, S-Planar 0,48mm f/5, S-Planar 32mm f/5,6, S-Orthoplanar 105mm f/5,6 ed S-Planar 60mm f/8: really a comprehensive and varied series indeed, ranging from lenses for microfilm (S-Planar and Orthoplanar 50mm f/4, 60mm f/4 and 105mm f/5,6) to those for laser medical (the very short focal lengths) to those designed for microlithography of microchips; precisely the larger models in this category, which also includes the S-Planar 25mm f/1,6 just discussed, reached impressive prices, even 500,000 DM of the time!”

网上搜的蔡司公司生产的部分工业用镜头的资料。 其中S-Planar 25mm f/1.6 的价格竟然高达500，000DM！
不知道国产的这些当年售价多少？

kievuserK

信息社会中不可或缺的集成电路芯片，则要靠光刻机来制造。光刻机在芯片制造业中的地位和作用就相当于机床在机械制造业中的地位和作用。一台光刻机中的核心子系统包括：超精密环境参数控制系统、大功率深紫外激光器、超大数值孔径的透镜组、纳米移动定位系统、超高精度多自由度移动工作台等等。
　　目前上海微电子的光刻机能够刻蚀90nm的集成电路，距离国外先进水平还有相当的差距，不过这已经为中国的电子工业提供了相当的支持，毕竟并非所有的芯片都需要做到20nm。中国的自主CPU龙芯2F采用90nm制程可以达到800MHz的主频，性能高于1GHz的Pentium III，这就是说，中国已经可以自主掌握这一水平的CPU制造了，其经济意义和军事意义都不可低估。更为重要的是，在解决了有和无的问题之后，在此基础上中国将会继续冲击更高端的光刻设备，自主制造更高端的芯片。
　　光刻机是一个极其复杂的光机电系统，其中的核心零件也都需要高端的特殊设备才能加工出来，比如光学系统中的透镜。为了降低衍射效应以便得到更细的线宽，光刻机中使用的激光波长只有通常可见光的三分之一，因此对透镜表面光洁度的要求比普通光学零件要高出三倍，为此必须使用特殊的抛光技术，才能满足其极为苛刻的形貌指标。
　　光刻机所涉及的产业链非常长、非常高端，世界上没有任何一个国家可以完全独立地掌握其全部子系统的研发和制造技术。目前世界上最大的光刻机生产商ASML是荷兰公司，光刻机中的光学镜组来自德国、干涉测量系统来自美国，其产品可以说是整个西方世界科技成果的总和。在这方面，中国要想取得独立自主的发展，实际上是在以一己之力追赶所有发达国家数百年的积累，每一个单项的突破都意味着中国又追上了一步，这个过程将会是漫长而艰辛的。不过依托完整的产业链、庞大的工业产能和雄厚的人才基础，中国的IC产业最终实现全面超越是完全可以期待的。
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网上扒的。几年前的消息。估计现在应该又有了进步了。

木鱼

kievuserK 发表于 2015-5-22 18:50
一款上照三厂生产的光刻镜头。

改数码相机头成像如何